0190-91072-02

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The Sanyo Denki 0190-91072-02, part of the PM Drivers series, is an RF Match used in plasma processing with a standard frequency of 13.56 MHz. It supports RF power up to several kilowatts, operates at a nominal impedance of 50 Ohms, and can be air or water-cooled. It is commonly used for plasma etching and thin film deposition.

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Product Description:

The 0190-91072-02 from Sanyo Denki is an RF Match designed specifically for plasma processing systems. It’s part of the PM Drivers series and mainly works at a frequency of 13.56 MHz, which is the standard for semiconductor plasma processing. This device handles RF power levels up to several kilowatts, making it powerful enough for heavy-duty plasma etching and thin film deposition tasks. Its nominal impedance is 50 Ohms, which matches typical plasma equipment, helping reduce power loss and improve efficiency.

Cooling options depend on the exact model but can be either air-cooled or water-cooled, which gives you flexibility depending on your setup and cooling needs. The unit fits into standard industrial racks with size and weight varying a bit, generally falling between 10 to 25 kg. This weight range helps with handling but also indicates it’s built tough for continuous operation. The RF Match plays a crucial role in matching impedance between the plasma source and load, reducing reflected power and protecting sensitive components. Its control interface can be analog or digital, depending on your system’s requirements, so it can easily integrate with most plasma processing platforms.

This RF Match is widely used in thin film deposition and plasma etching, common processes in semiconductor manufacturing and surface treatment industries. It’s compatible with equipment from leading suppliers like Applied Materials, especially their LPCVD, PECVD, and etch platforms. With its robust construction and reliable performance, the 0190-91072-02 ensures steady plasma generation and consistent processing results. Whether you need to optimize plasma power or protect your RF system from mismatch damage, this Sanyo Denki model fits right into demanding industrial environments without fuss.

Compatible Platforms
Applied Materials LPCVD, PECVD, Etch platforms
Control Interface
Analog or digital (model dependent)
Cooling
Air or water cooled (model dependent)
Dimensions
Varies by system; typically rack-mountable
Frequency Range
Typically 13.56 MHz (semiconductor plasma processing standard)
Impedance
50 Ohms nominal
Input Power
RF Power up to several kilowatts (model dependent)
Type
RF Match (Matching Network)
Typical Use
Plasma etching, thin film deposition processes
Weight
Varies; typically 10–25 kg

Frequently Asked Questions about 0190-91072-02:

Q: What RF power levels can the Sanyo Denki 0190-91072-02 RF Match handle?

A: The Sanyo Denki 0190-91072-02 RF Match can support RF power levels up to several kilowatts, depending on the specific model.

Q: What cooling options are available for the 0190-91072-02 RF Match?

A: The 0190-91072-02 RF Match can be either air or water-cooled, depending on the specific model.

Q: What is the standard operating frequency of the Sanyo Denki 0190-91072-02 RF Match?

A: The Sanyo Denki 0190-91072-02 RF Match operates at a standard frequency of 13.56 MHz.

Q: What are the typical applications for the Sanyo Denki 0190-91072-02 RF Match?

A: The Sanyo Denki 0190-91072-02 RF Match is commonly used for plasma etching and thin film deposition processes.

Q: What impedance does the 0190-91072-02 RF Match support?

A: The 0190-91072-02 RF Match unit supports a nominal impedance of 50 Ohms.


Internal Product Review

  • ‘‘0190-91072-02 RF Match is a reliable and efficient solution for plasma processing. Its wide frequency range and robust construction make it ideal for demanding industrial applications, ensuring consistent performance.’’

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